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Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
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Page 5
Tuesday, November 1, 2022
Aki Fujimura, CEO of D
2
S, meets with Dr. Frank Abboud of Intel to reflect on key moments from his career.
English
Thursday, October 20, 2022
Semiconductor Engineering: Why Changes in Computing are Driving Changes in Photomasks
English
Friday, August 5, 2022
Design Automation Conference 2022 TechTalk: Is Curvy Design an Opportunity or a Dream?
English
Tuesday, April 26, 2022
Semiconductor Engineering: Using GPUs In Semiconductor Manufacturing
English
Tuesday, April 19, 2022
Leo Pang of D
2
S provides an overview of the evolution of ILT from his SPIE JM3 ILT review paper published in 2021
English
Tuesday, April 19, 2022
Aki Fujimura interviews Mike Hermes, vice president of mask technology at Micron, about the changing landscape in mask making, including the shift to multi-beam mask writing and curvilinear masks
English
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