Breaking news from the SPIE Photomask Technology + EUV conference about Large Format Photomasks announced by ASML and TSMC. Aki Fujimura, CEO of D2S, was on hand as President of BACUS to provide this update.
Asmus Hetzel of D2S describes the limitations of current Gaussian models and introduces Freeform Point Spread Function (FF PSF) models as a solution for EUV (or any) masks.
Aki Fujimura reflects on how far the industry has come in terms of computational resources and multi-beam mask writing to enable the move to curvilinear masks and design. He goes on to explain why entirely curvilinear masks are entirely manufacturable and how it matters to wafer uniformity. Recorded at the eBeam Initiative annual lunch during SPIE ALP.
Mike Hadsell of Tekscend talks about IPOs, EUV and ArF mask equipment investments, AI and curvilinear trends, as well as offers career advice in this wide-ranging interview with Aki Fujimura of D2S.
Abhishek Shendre of D2S describes how PLDC can make curvy mask shapes manufactureable for improved wafer quality. Leo Pang of D2S presents Abhishek's talk in Chinese.
