News | D2S

Semiconductor Engineering: Mask Technology Faces A New Set Of Challenges

News • May 21, 2026

Experts at the Table conversation with Aki Fujimura, CEO at D2S; Glen Scheid, operations manager at Micron; Harry Levinson, principal lithographer at HJL Lithography; and Germain Fenger, senior director of product management at Synopsys.

Semiconductor Engineering: eBeam Initiative At SPIE ALP 2026: Continuing Progress On Curvilinear, EUV, And Data Challenges

News • April 16, 2026

New videos from D2S, Tekscend Photomask, and imec are highlighted in this round-up article.

Substack: Semiecosystem: The Latest News In Lithography

News • April 3, 2026

Mark LaPedus' lastest update includes a link to the video of D2S CEO Aki Fujimura's recent presentation on curvilinear masks.

Semiconductor Engineering: Challenges In Scaling Chips To 2nm And Below

News • March 30, 2026

D2S CEO Aki Fujimura's recent presentation on curvilinear masks is cited as an example of the many techniques being employed for 2nm-and-below chips.

Aki Fujimura Delivered Keynote Speech at Conference of Science & Technology for Integrated Circuits (CSTIC) March 22-24, 2026

News • March 23, 2026

D2S CEO spoke on "Changing the Face of Silicon: Curvy Manufacturing Will Lead to Curvy Design," during the Plenary Session. PDF of the slides below.

Semi: Meet D2S’ Aki Fujimura Whose Career Spans Manhattan to Curvilinear Design

News • February 23, 2026

A conversation with D2S CEO Aki Fujimura and Bob Smith, executive director of the ESD Alliance, a SEMI Technology Community.