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Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
Technologies
Uniformity
The critical success factor
Mask Uniformity
Path to wafer uniformity
Wafer Uniformity
Achieving the best process window
GPU Acceleration
Practical full-reticle processing
Curvilinear
Better mask and wafer quality
Pixel Domain
Shape-agnostic computing
Products
PLDC
MPC for uniformity and linearity
TrueMask
®
ILT
Full-chip, Entirely Manufacturable™ ILT
TrueModel
®
Physical model for masks and wafers
CDP
GPU-accelerated design platform
About D
2
S
About D
2
S
Timeline of D
2
S Technology Highlights
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Page 12
Monday, March 16, 2015
eBeam Initiative: Shot Talk catches up with Aki Fujimura, CEO of D
2
S, who shares his thoughts on the key themes and hot topics from SPIE 2015
English
Monday, March 16, 2015
Semiconductor Engineering: Video Tech Talk on Moore’s Law – Device scaling isn’t slowing down, but it is changing; Ed Sperling interviews Aki Fujimura
English
Thursday, December 11, 2014
eBeam Initiative: Semiconductor Engineering Tech Talk – Inverse Lithography by Leo Pang, D
2
S
English
Monday, October 13, 2014
eBeam Initiative: Aki Fujimura, CEO of D
2
S, explains how context-dependent mask effects require simulation-based MDP; video in English and in Japanese
English
日本語
Saturday, June 14, 2014
eBeam Initiative: Aki Fujimura describes how the acquisition of Gauda and the hiring of Dr. Leo Pang will enable D
2
S to better support the eBeam community
English
Tuesday, March 18, 2014
eBeam Initiative: Aki Fujimura explains the mask hotspots trend
English
日本語
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