Menu

News

Menu
Page 30

D2S Expands GPU Acceleration Capability for Advanced Semiconductor Lithography and Photomask Manufacturing with Acquisition of Gauda

Press Release • June 3, 2014

Latest-generation Computational Design Platform more than doubles processing speed and enables the first inline dose correction in multi-beam mask writers.
English
日本語

Lithography Luminary Dr. Leo Pang Joins D2S as Chief Product Officer

Press Release • May 12, 2014

English
日本語

GPU Based Lithography Simulation and OPC

Publication • February 1, 2014

University of Massachusetts Amherst Masters Thesis by Lokesh Subramay
Read More

D2S and NuFlare Extend Partnership to Accelerate eBeam Computational Design Platform Deployment for Advanced Photomasks

Press Release • September 9, 2013

English
日本語

Ecosystem Quote Sheet for TrueMask® MDP — the First and Only Model‐Based Mask Data Preparation Solution to Process Full‐Chip Design Data for Production Applications

News • September 11, 2012

Read More

D2S Unveils eBeam Solution that Both Reduces Photomask Write Time and Improves Photomask Accuracy at 20‐nm Node and Beyond

Press Release • September 11, 2012

TrueMask® MDP is the First and Only Model‐Based Mask Data Preparation Solution   to Process Full‐Chip Design Data for Production Applications
English
日本語
Older Posts
Newer Posts