Papers & Publications
Photomask Japan 2010: Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa – JEOL, David Kim, Vikram Tolani and Tom Cecil – Luminescent Technologies; [April 2010]
Photomask Japan 2010: Efficiently writing circular contacts on production reticle; Aki Fujimura – D2S, Christophe Pierrat – IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa – JEOL; [April 2010]
Photomask Japan 2010: Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count
Harold R. Zable and Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen – Petersen Advanced Lithography; [April 2010]
ElectroIQ: Podcasts – Aki Fujimura, President & CEO of D2S makes the case for DFEB [March 30, 2010]
ISQED: Design for E-Beam: Getting the Best Wafers Without the Exploding Mask Costs, Aki Fujimura from D2S [March 24, 2010]