Press Releases
DFeB Technology Leader D2S Appoints New President of Japanese Subsidiary
Oct. 1, 2011
View the full press release in Japanese or Masahiro Tateishi’s biography under Executive Team (create jump to Executive Team page by clicking on it)
D2S Unveils Industry's First Mask-Wafer Double Simulation Platform - TrueMask™ DS enables interactive optimization of mask write-times and wafer quality
Sep. 20, 2011
View the full press release in English & Japanese
D2S Taps Industry Semiconductor EDA Veteran to Serve as Vice President of Engineering
Mar. 29, 2011
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Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask – D2S Option to NuFlare EBM-700 System Enalbes Design for E-Beam (DFEB) Mask Technology
Mar. 1, 2011
View the full press release in English & Japanese
eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 – E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative
Feb. 22, 2011
View the full press release in English & Japanese