Press Releases
D2S Expands Management Team with Photomask and Semiconductor Industry Veterans – New Hires from Intel, KLA-Tencor and Synopsys Bring Wealth of Semiconductor Experience as D2S Enters Next Stage of Growth
Feb. 13, 2012
View the full press release in English & Japanese
eBeam Initiative Roadmap to Focus on Semiconductor Photomask Critical Dimension Uniformity at SPIE Advanced Lithography 2012 Symposium – Proof Points at SPIE demonstrate the ability of eBeam Technologies to Improve 20-nm and 14-nm Wafer Yields
Feb. 13, 2012
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DFeB Technology Leader D2S Appoints New President of Japanese Subsidiary
Oct. 1, 2011
View the full press release in Japanese or Masahiro Tateishi’s biography under Executive Team
D2S Unveils Industry's First Mask-Wafer Double Simulation Platform - TrueMask™ DS enables interactive optimization of mask write-times and wafer quality
Sep. 20, 2011
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D2S Taps Industry Semiconductor EDA Veteran to Serve as Vice President of Engineering
Mar. 29, 2011
View the full press release in English & Japanese