Press Releases

eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Companies Join eBeam Initiative
Sep. 7, 2010

View the full press release in English & Japanese



D2S CEO AKI FUJIMURA TO PARTICIPATE IN 22‐NM MANUFACTURING PANEL AT DAC 2010
May. 25, 2010

View the full press release in English



eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative
Apr. 13, 2010

View the full press release in English & Japanese



D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production
Apr. 13, 2010

View the full press release in English & Japanese



D2S Redefines Mask Rules for the 22-nm and Smaller Technology Nodes
Feb. 23, 2010

View the full press release in English & Japanese




Press Release Archive

Designed by 4GE Media