Bala Thumma will be responsible for D2S’ GPU-accelerated pixel-level dose correction (PLDC) technology, which enhances pattern fidelity and accuracy for writing all masks including curvilinear.
EUV patterning has come a long way in the past five years, but old challenges resurface with high-NA EUV. Dr. Leo Pang of D2S adds his perspective on advanced lithography and curvilinear masks for EUV.
