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Semiconductor Engineering: Mask Complexity, Cost and Change – eBeam Initiative Roundtable

News • May 22, 2025

Experts at the Table: Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics
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Photomask Japan: Micron, NuFlare, and D2S Named in Best Paper Awards at PMJ 2025

News • May 20, 2025

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Three Ways to Improve Wafer Uniformity

News • April 21, 2025

Presented by Aki Fujimura, D2S at PMJ 2025 [April 18, 2025]
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Semiconductor Engineering: Three Ways Curvy ILT Together With PLDC Improves Wafer Uniformity

News • April 15, 2025

D2S CEO Aki Fujimura's second blog in the series explains how improving mask manufacturing is the simplest way to reduce wafer variation.
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SPIE AL: Pixel-Level Dose Correction (PLDC): Improving Uniformity and Linearity of Manhattan and Curvilinear Masks in 0 TAT

News • February 25, 2025

Presented by D2S CEO Aki Fujimura at eBeam Initiative luncheon at SPIE AL.
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Semiconductor Engineering: Improving Uniformity and Linearity for All Masks

News • January 29, 2025

Pixel-level dose correction improves the quality of masks written by multi-beam. Blog by D2S CEO Aki Fujimura.
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