News | D2S

Expert Panel Sees History Of Continuous Photomask Innovations As Key To The Future

News • October 27, 2025

The state of photomask revenues, EUV pellicles, and curvilinear masks. Panel included Jim Wiley, Wiley Strategic Solutions, Chan-UK (CU) Jeon, CTO of Tekscend Photomask, and Harry Levinson, HJL Lithography, and was moderated by Aki Fujimura, CEO of D2S.

Leo Pang from D2S to deliver keynote at SPIE International Workshop for Advanced Patterning Solutions (IWAPS) on October 14, 2025

News • September 18, 2025

"The Most Effective Way to Advance Technology Nodes -- Even Mature Ones: Production-Ready, Full-Chip, Curvilinear ILT and Curvilinear Masks for DUV"

Semiconductor Digest: PLDC: A Robust MPC Solution for any Mask Shape with Zero Impact on Turnaround Time

News • September 6, 2025

Paris Spinelli from Micron Technologies details their experience with the D2S PLDC solution.

EE Times: U.S. Startups Debut First eBeam Tools for Wafer Writing

News • August 11, 2025

D2S CEO, Aki Fujimura, is quoted in this article covering new companies producing eBeam tools for wafer writing.

Semiconductor Engineering: Disruptive Changes Ahead For Photomasks?

News • June 25, 2025

Evolving lithography demands are challenging mask writing technology, and the shift to curvilinear is happening. Experts at the Table, part 3, with Harry Levinson, principal lithographer at HJL Lithography; Aki Fujimura, CEO of D2S; Ezequiel Russell, senior director of mask technology at Micron; and Christopher Progler, executive vice president and CTO at Photronics.

Semiconductor Engineering: Variable Bias Completes The PLDC Model And Offers Superior MPC Results

News • June 19, 2025

D2S CEO, Aki Fujimura's final blog in the series explains how PLDC offers superior linearity correction and uniformity enhancement for Manhattan and curvilinear masks.