Maskless/E-Beam Discussions

• DFEB, a novel approach to EbDW throughput enhancement for volume production, T. Maruyama, S. Sugatani, H. Tsuchikawa from e-Shuttle; H. Hoshino, Y. Machida, M. Ito from Fujitsu Microelectronics; H. Tago, L. Chau, S. Lee from D2S; and H. Komami from Advantest.
  
  
• Design For E-Beam Using Talus on a 65nm Test Chip, Shone K. Lee, Haruyuki Tago, Larry Chau, Tam Nguyen from D2S, Inc., Subbayyan Venkatesan, Sultana Begum from Fastrack Design, Inc.
  
  
• E-beam direct write is free, Lance A. Glasser, Ph.D.
  
  
• Projection Maskless Lithography
  
  
• Hans C. Pfeiffer, "The history and potential of maskless e-beam lithography", Microlithography World February, 2005
  
  
• Electron beam direct write technology combined with silicon shuttle service, H. Tsuchikawa, M. Takakuwa, S. Sugatani, 4th ISMI Symposium on Manufacturing Effectiveness, October 2007 (Download here link from D2S site)
  
  
• B.J. Lin, "The ending of optical lithography and the prospects of its successors," Microelectronic Engineering, 83, 604-613 2006.
  
  
• P. Buck, C. Biechler, and F. Kalk, "A Mask Manufacturer's Perspective on Maskless Lithography," Bacus Symposium 25; October 2005.
  
  
• Y. Nagahiro, "Application scope of EB exposure writing expands from R&D of advanced devices to prototyping and small production," Nikkei Microdevices, p. 31, June 2003.
  
  
• Electron Beam Lithography in Semiconductor Fabrication, Thomas Breser, Leica Microsystems Semiconductor GmbH , February 2005