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Featured News & Papers
BACUS 2011 Best Poster Session: Optimization of mask shot count using MB-MDP and lithography simulation by GLOBALFOUNDRIES and D2S
September 20, 2011
D2S Unveils Industry's First Mask-Wafer Double Simulation Platform
September 20, 2011
D2S, NuFlare ink e-beam deal
March 1, 2011
 
D2S is a US-registered trademark and TrueMask is a trademark of D2S, Inc.
products and technology are covered by patents, patent applications or other intellectual property rights including but not limited to United States patent numbers: 7,579,606; 7,745,078; 7,747,977; 7,754,401; 7,759,026; 7,759,027; 7,772,575; 7,799,489; 7,901,845; 7,901,850; 7,914,954; 7,981,575; 7,985,514; 8,017,286; 8,017,288; 8,017,289; 8,039,176; 8,057,970; 8,062,813.

© 2012 D2S, Inc.