Papers & Publications
BACUS 2011: Optimization of mask shot count using MB-MDP and lithography simulation [September 20,2011]
EE Times: 2S-tips-mask-wafer-double-simulation-tool"> D2S tips mask-wafer double litho simulator [September 20, 2011]
ElectroIQ: Litho tool explores tradeoffs at 20nm and below [September 20, 2011]
ElectroIQ: D2S doubles down with new mask-wafer double simulation workstation [September 20, 2011]
Semiconductor Manufacturing & Design: D2S Introduces TrueMask Mask-Wafer Simulation Tool [September 20, 2011]
SPIE 2011: Model-Based Mask Data Prep (MB-MDP) and its effect on heating [March 2, 2011]
SPIE 2011: E-beam Direct Write Overview [March 1, 2011]
eBeam Initiative: Model-Based Mask Data Preparation Using Overlapping Shots: Making Optical Lithography Cost-effective for 20-nm Devices [March 1, 2011]
LithoVision 2011: Status of Masks - Current Status and Issues for ArF Extension, Nobuhito Toyama, DNP [February 27, 2011]
Solid State Technology: The future of lithography [February 2011]
BACUS 2010: Improvement of Mask Write Time for Curvilinear Assist Features at 22nm; Aki Fujimura – D2S, Ingo Bork – D2S, Taiichi Kiuchi – JEOL, Tadashi Komagata – JEOL, Yasutoshi Nakagawa - JEOL, Kazuyuki Hagiwara – D2S KK, Daisuke Hara – D2S KK [September 14, 2010]
BACUS 2010: Writing 32nm-hp Contacts with Curvilinear Assist Features; Aki Fujimura – D2S, David Kim – Luminescent Technologies, Ingo Bork – D2S, Christophe Pierrat – IC Images Technologies [September 14, 2010]
BACUS 2010: Impact of Model-Based Fracturing on E-beam Proximity Effect Correction Methodology; Christophe Pierrat - IC Images Technologies, Ingo Bork D2S [September 14, 2010]
BACUS 2010: Design for e-beam: design insights for direct-write maskless lithography; Aki Fujimura - D2S [September 15, 2010]
Solid State Technology WaferNews Podcast: D2S’s Fujimura: Making the “impossible” photomask possible [September 21, 2010]
EE Times: E-beam: Ecosystem investment grows, but more needed by Aki Fujimura [September 20, 2010]
Photomask Japan 2010: Best paper award at PMJ 2010 - Best depth of focus on 22nm logic wafers with less shot count; Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa – JEOL, David Kim, Vikram Tolani and Tom Cecil – Luminescent Technologies; [April 2010]
Photomask Japan 2010: Efficiently writing circular contacts on production reticle; Aki Fujimura – D2S, Christophe Pierrat – IC Images Technologies, Taiichi Kiuchi, Tadashi Komagata and Yasutoshi Nakagawa – JEOL; [April 2010]
Photomask Japan 2010: Writing "wavy" metal 1 shapes on 22 nm Logic Wafers with Less Shot Count
Harold R. Zable and Aki Fujimura – D2S, Tadashi Komagata and Yasutoshi Nakagawa - JEOL, John S. Petersen – Petersen Advanced Lithography; [April 2010]
ElectroIQ: Podcasts – Aki Fujimura, President & CEO of D2S makes the case for DFEB [March 30, 2010]
ISQED: Design for E-Beam: Getting the Best Wafers Without the Exploding Mask Costs, Aki Fujimura from D2S [March 24, 2010]
eBeam Initiative: Circles: One Key to Successful Lithography at Advanced Nodes, Aki Fujimura from D2S [February 23, 2010]
Solid State Technology: Making E-beam direct write faster, Kiichi Sakamoto from Advantest and Aki Fujimura from D2S [November 19. 2009]
ICCAD: Beyond Light: The Growing Importance of E-Beam, Aki Fujimura from D2S [November 2, 2009]
GSA Forum: Test Chip Collaboration Validates That Virtually Maskless SOCs Are Now Practical, Moazzem Hossain from Fastrack, Bob Smith from Magma and Aki Fujimura from D2S [September 2009]
EIPBN: DFEB, a novel approach to EbDW throughput enhancement for volume production, T. Maruyama, S. Sugatani, H. Tsuchikawa from e-Shuttle; H. Hoshino, Y. Machida, M. Ito from Fujitsu Microelectronics; H. Tago, L. Chau, S. Lee from D2S; and H. Komami from Advantest [May 29, 2009]
Magma User Conference: Design For E-Beam Using Talus on a 65nm Test Chip, Shone K. Lee, Haruyuki Tago, Larry Chau, Tam Nguyen from D2S, Inc., Subbayyan Venkatesan, Sultana Begum from Fastrack Design, Inc. [April 2, 2009]
GSA Forum: Enabling the Long Tail of SOCs, Aki Fujimura from D2S [September 2008]
SPIE: E-beam direct write is free, Lance A. Glasser, Ph.D. [2007]