News | D2S

EDA Cafe: Keysight to Co-Host ESD Alliance 2024 CEO Executive Outlook Featuring RISC-V Executives

News • April 11, 2024

D2S CEO Aki Fujimura to participate in May 9 panel discussion. Register now

Semiconductor Digest: eBeam Initiative Marks 15-Year Anniversary

News • February 28, 2024

D2S CEO Aki Fujimura speaks about the past, present and future of the eBeam Initiative

Aki Fujimura presents retrospective at eBeam Initiative 15th Anniversary event

News • February 27, 2024

D2S CEO reviews how far the mask industry has come in the last 15 years at eBeam Initiative lunch at SPIE-AL 2024

SPIE: Throwing Lithography a Curve

News • February 20, 2024

Mask wafer co-optimization makes it practical to create curved shapes using variable shaped beam mask writers

SEMI: D2S CEO Aki Fujimura: Curvy Design’s Time Has Come

News • February 5, 2024

SEMI's Bob Smith interviews D2S, Inc. CEO Aki Fujimura about the prospects for curvilinear design.

Semiconductor Engineering: Industry Luminaries Highlight Opportunities For Advancing The Non-EUV Leading Edge

News • December 19, 2023

At the SPIE Photomask Technology Conference in October, Aki Fujimura, CEO of D2S, Inc., moderated a panel discussion of the factors driving 193i lithography down to smaller nodes. He was joined by Chris Progler, CTO of Photronics; Glen Scheid, Operations Manager at the Micron Mask Technology Center; and Harry Levinson, Principal Lithographer at HJL Lithography.