Press Releases
DFeB Technology Leader D2S Appoints New President of Japanese Subsidiary
Oct. 1, 2011
View the full press release in Japanese or Masahiro Tateishi’s biography under Executive Team (create jump to Executive Team page by clicking on it)
D2S Unveils Industry's First Mask-Wafer Double Simulation Platform - TrueMask™ DS enables interactive optimization of mask write-times and wafer quality
Sep. 20, 2011
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D2S Taps Industry Semiconductor EDA Veteran to Serve as Vice President of Engineering
Mar. 29, 2011
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Fellow eBeam Initiative Members D2S and NuFlare Partner to Reduce Write Times for Complex 22-nm Photomask – D2S Option to NuFlare EBM-700 System Enalbes Design for E-Beam (DFEB) Mask Technology
Mar. 1, 2011
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eBeam Initiative Members Present Collaborative Results at SPIE Advanced Lithography Symposium 2011 – E-beam Advancements Featured for both Complex Photomasks and Maskless Lithography; New Members Added to eBeam Initiative
Feb. 22, 2011
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eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010 – Four New Companies Join eBeam Initiative
Sep. 7, 2010
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D2S CEO AKI FUJIMURA TO PARTICIPATE IN 22‐NM MANUFACTURING PANEL AT DAC 2010
May. 25, 2010
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eBeam Initiative Members Publish Collaborative Results at Photomask Japan 2010 – Three New Companies Join eBeam Initiative
Apr. 13, 2010
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D2S and JEOL Partner to Reduce Write Times for Advanced Photomask Production
Apr. 13, 2010
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D2S Redefines Mask Rules for the 22-nm and Smaller Technology Nodes
Feb. 23, 2010
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eBeam Initiative Membership Grows to 27 - Initiative Introduces DFEB Mask Roadmap for High Volume Integrated Circuits
Feb. 23, 2010
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eBeam Initiative Introduces Design for E-Beam Methodology Guidelines and Training Courses
Nov. 9, 2009
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D2S to Speak at the International Conference on Computer-Aided Design
Oct. 12, 2009
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eBeam Initiative Members Collaborate to Enhance Design for E-Beam Throughput:
Oct. 1, 2009
D2S' DFEB Packed Stencil Technology and Advantest Corporation’s Direct Write Lithography Equipment Increase DFEB Character Set by More Than 4X, October 1, 2009
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Silicon Results Validate Design for e-Beam Methodology at the 65-nm node
May. 26, 2009
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Kazuyuki Kawauchi, former CEO of Fujitsu Microelectronics America, Appointed President of D2S KK
Apr. 21, 2009
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D2S Secures $9 Million In Series B Financing
Apr. 1, 2009
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eBeam Initiative Members to Present at Magma User Conference
Mar. 26, 2009
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20 Electronic Industry Leaders Collaborate to Accelerate Development and Adoption of Design for E-Beam Technology
Feb. 24, 2009
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Vistec, CEA/Leti and D2S Join Forces on E-Beam Direct Write Solutions for the 45- and 32-nm Nodes
Jan. 12, 2009
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Fujitsu Microelectronics, e-Shuttle and D2S to Develop Maskless ICs.
Oct. 8, 2008
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