News Archive
Solid State Technology:
Making E-beam direct write faster [November 19, 2009]
eBeam Initiative:
DFEB Guidelines for Physical Design Engineers V2.1, eBeam Initiative, November 9, 2009
ICCAD:
Beyond Light: The Growing Importance of E-Beam, Aki Fujimura, ICCAD November 2, 2009
EE Times:
17 startups join the EE Times' Silicon 60 [October 5, 2009]
Nikkei BP:
「EB直描のスループットを1ケタ向上」，D2Sらが新手法 を開発 [October 2, 2009]
EE Times:
D2S, Advantest speed up e-beam lithography [October 2, 2009]
EE Times Europe:
German startup joins e-beam initiative [Sept 16, 2009]
GSA Forum:
Test Chip Collaboration Validates That Virtually Maskless SOCs Are Now Practical [September 2009]
EE Times Europe:
Leti receives Mapper 300-mm e-beam lithography platform [July 21, 2009]
EDN:
Fragmentation threatens the roadmap for advanced lithography [July 17, 2009]
Semiconductor Times:
D2S company profile reprinted with permission http://www.pinestream.com [May 2009]
Nikkei BP:
富士通マイクロらが65nmチップで効果を実証，EB直描向けLSI設計環境 [May 27, 2009]
Semiconductor Fabtech:
EE Times:
65-nm test chip said to validate design-for-e-beam [May 26, 2009]
Nikkei BP:
「日本の半導体を元気にしたい」，D2Sの新社長に元富士通マイクロの河内氏が就任
EE Times:
Design-for-ebeam firm closes $9 million in funding [Apr. 2, 2009]
Nikkei Microdevices:
BetaSights:
eBeam Initiative and Tool Competition
EDN:
Heard at SPIE: direct-write e-beam production inches closer
Semiconductor International:
New Collaboration Aims to Accelerate Direct-Write E-Beam Adoption
EE Times:
Initiative forms around e-beam direct write
Semiconductor International:
E-Beam Technology Breaks Through Complex Design Cycles
Semiconductor International:
Executive Outlook: Survival and Opportunities in 2009
BetaSights:
CEA/Leti, Vistec, and D2S push EbDW
EE Times:
Firms to collaborate on e-beam direct write
EDN:
D2S replicates direct-write e-beam scheme in Europe, moves to 45 and 32 nm
EDN:
Announcement by D2S completes the picture for Fujitsu maskless e-Shuttle
GSA Forum:
Enabling the Long Tail of SOCs
SCD Source:
Startup preps e-beam lithography for SoCs and ASICs
EE Times:
Fujitsu, Advantest form e-beam venture
EE Times:
E-beam litho ready to rise again, says Vistec
EE Times:
Startup Multibeam enters maskless lithography race
Semiconductor International: