D2S, Inc. - Design 2 Silicon

D2S Expands Management Team with Photomask and Semiconductor Industry Veterans
February 13, 2012

MB-MDP Enables Circular Shots to Improve Mask Accuracy as Well as Shot Count
February 13, 2012

BACUS 2011 Best Poster Session: Optimization of mask shot count using MB-MDP and lithography simulation by GLOBALFOUNDRIES and D2S
September 20, 2011

Expanding Team

D2S is about software for e-Beam manufacturing of masks and wafers. By leveraging the tremendous computational power available now by combining coarse-grain and fine-grain parallelism, we simulate a one quintillion pixel dose map. Our customers are working on the bleeding edge of technology at 20-nm logic node and below. We help customers write 40-nm features with 1-nm accuracy. We are a semiconductor technology start-up company driving the upcoming decade of e-Beam. Please contact us to join our team.

There are three ways to join our team:

Employees | We are looking for high energy, high IQ and high EQ contributors who are looking to be rewarded for dedication and hard work to make our customers and partners successful.

• Application Engineering Team: San Jose, Taiwan. Please email us if you are interested.
• Software Engineering Team: Optimization Algorithms. Please email us if you are interested.

Consultants | We want to leverage your skills and expertise, particularly in the ecosystem around e-Beam writing of masks and wafers. Expertise in resist, processing, materials, modelling, e-Beam, ArF lithography, EUV lithography, and local business development would be welcome. Please email us if you are interested.

eBeam Initiative Partners | We would like your company to join us to raise the industry awareness in the importance and the value of e-Beam technologies for the semiconductor industry. Please visit www.ebeam.org

D2S is a US-registered trademark and TrueMask is a trademark of D2S, Inc.
products and technology are covered by patents, patent applications or other intellectual property rights including but not limited to United States patent numbers: 7,579,606; 7,745,078; 7,747,977; 7,754,401; 7,759,026; 7,759,027; 7,772,575; 7,799,489; 7,901,845; 7,901,850; 7,914,954; 7,981,575; 7,985,514; 8,017,286; 8,017,288; 8,017,289; 8,039,176; 8,057,970; 8,062,813; 8,137,871.