D2S, Inc. - Design 2 Silicon

D2S Expands Management Team with Photomask and Semiconductor Industry Veterans
February 13, 2012

MB-MDP Enables Circular Shots to Improve Mask Accuracy as Well as Shot Count
February 13, 2012

BACUS 2011 Best Poster Session: Optimization of mask shot count using MB-MDP and lithography simulation by GLOBALFOUNDRIES and D2S
September 20, 2011

D2S is a US-registered trademark and TrueMask is a trademark of D2S, Inc.
products and technology are covered by patents, patent applications or other intellectual property rights including but not limited to United States patent numbers: 7,579,606; 7,745,078; 7,747,977; 7,754,401; 7,759,026; 7,759,027; 7,772,575; 7,799,489; 7,901,845; 7,901,850; 7,914,954; 7,981,575; 7,985,514; 8,017,286; 8,017,288; 8,017,289; 8,039,176; 8,057,970; 8,062,813; 8,137,871.