DFEB

DFEB is a design-to-manufacturing approach to enhance the throughput of e-beam (EB) lithographic exposure. DFEB uses character or cell projection (CP) technology combined with design and software techniques to reduce a design's required shot count resulting in increased CP e-beam direct-write (EbDW) throughput.


If you are designing an SoC for 65/45nm and you need rapid prototypes and/or volumes less than 100,000 chips, talk to us.